Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
出版年份 2022 全文链接
标题
Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
作者
关键词
-
出版物
Advanced Electronic Materials
Volume -, Issue -, Pages 2200601
出版商
Wiley
发表日期
2022-08-04
DOI
10.1002/aelm.202200601
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO2 films
- (2021) Lutz Baumgarten et al. APPLIED PHYSICS LETTERS
- Compositional and phase dependence of elastic modulus of crystalline and amorphous Hf1-xZrxO2 thin films
- (2021) Shelby S. Fields et al. APPLIED PHYSICS LETTERS
- Metal Nitride Electrode Stress and Chemistry Effects on Phase and Polarization Response in Ferroelectric Hf 0.5 Zr 0.5 O 2 Thin Films
- (2021) Shelby S. Fields et al. Advanced Materials Interfaces
- Wake-up and fatigue mechanisms in ferroelectric Hf0.5Zr0.5O2 films with symmetric RuO2 electrodes
- (2021) Shelby S. Fields et al. JOURNAL OF APPLIED PHYSICS
- Physical chemistry of the TiN/Hf0.5Zr0.5O2 interface
- (2020) W. Hamouda et al. JOURNAL OF APPLIED PHYSICS
- New tools for calibrating diffraction setups
- (2020) J. Kieffer et al. JOURNAL OF SYNCHROTRON RADIATION
- Phase-Exchange-Driven Wake-Up and Fatigue in Ferroelectric Hafnium Zirconium Oxide Films
- (2020) Shelby S. Fields et al. ACS Applied Materials & Interfaces
- Strain effect on the stability in ferroelectric HfO2 simulated by first-principles calculations
- (2020) Sheng-Ting Fan et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Enhanced ferroelectricity in ultrathin films grown directly on silicon
- (2020) Suraj S. Cheema et al. NATURE
- Interface chemistry of pristine TiN/La: Hf 0.5 Zr 0.5 O 2 capacitors
- (2020) W. Hamouda et al. APPLIED PHYSICS LETTERS
- Compositional dependence of linear and nonlinear optical response in crystalline hafnium zirconium oxide thin films
- (2020) Jon F. Ihlefeld et al. JOURNAL OF APPLIED PHYSICS
- Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide
- (2020) Damir R. Islamov et al. APPLIED PHYSICS LETTERS
- Ultra-thin Hf0.5Zr0.5O2 thin-film-based ferroelectric tunnel junction via stress induced crystallization
- (2020) Youngin Goh et al. APPLIED PHYSICS LETTERS
- Unveiling the double-well energy landscape in a ferroelectric layer
- (2019) Michael Hoffmann et al. NATURE
- Phase transformation behavior of ultrathin Hf0.5Zr0.5O2 films investigated through wide range annealing experiments
- (2019) Shinji Migita et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Phase field modeling of domain dynamics and polarization accumulation in ferroelectric HZO
- (2019) Atanu K. Saha et al. APPLIED PHYSICS LETTERS
- Origin of Ferroelectric Phase in Undoped HfO 2 Films Deposited by Sputtering
- (2019) Terence Mittmann et al. Advanced Materials Interfaces
- On the Origin of the Large Remanent Polarization in La:HfO 2
- (2019) Tony Schenk et al. Advanced Electronic Materials
- Local crystallographic phase detection and texture mapping in ferroelectric Zr doped HfO2 films by transmission-EBSD
- (2019) M. Lederer et al. APPLIED PHYSICS LETTERS
- Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material
- (2018) Uwe Schroeder et al. INORGANIC CHEMISTRY
- The effect of the bottom electrode on ferroelectric tunnel junctions based on CMOS-compatible HfO2
- (2018) Youngin Goh et al. NANOTECHNOLOGY
- Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X-Ray Diffraction
- (2018) Min Hyuk Park et al. Advanced Electronic Materials
- Ultra-low power Hf0.5Zr0.5O2 based ferroelectric tunnel junction synapses for hardware neural network applications
- (2018) Lin Chen et al. Nanoscale
- Thermal resistance and heat capacity in hafnium zirconium oxide (Hf1–xZrxO2) dielectrics and ferroelectric thin films
- (2018) Ethan A. Scott et al. APPLIED PHYSICS LETTERS
- Low-voltage operation and high endurance of 5-nm ferroelectric Hf0.5Zr0.5O2 capacitors
- (2018) Si Joon Kim et al. APPLIED PHYSICS LETTERS
- Thickness scaling of pyroelectric response in thin ferroelectric Hf1−xZrxO2 films
- (2018) Sean W. Smith et al. APPLIED PHYSICS LETTERS
- Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films
- (2018) Damir R. Islamov et al. ACTA MATERIALIA
- Modeling ferroelectric film properties and size effects from tetragonal interlayer in Hf1–xZrxO2 grains
- (2017) Christopher Künneth et al. JOURNAL OF APPLIED PHYSICS
- Factors Favoring Ferroelectricity in Hafnia: A First-Principles Computational Study
- (2017) Rohit Batra et al. Journal of Physical Chemistry C
- Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf 0.5 Zr 0.5 )O 2 thin films deposited on various substrates
- (2017) Takahisa Shiraishi et al. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
- Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
- (2017) Min Hyuk Park et al. Nanoscale
- Preparation and characterization of ferroelectric Hf0.5Zr0.5O2 thin films grown by reactive sputtering
- (2017) Young Hwan Lee et al. NANOTECHNOLOGY
- Fatigue mechanism of yttrium-doped hafnium oxide ferroelectric thin films fabricated by pulsed laser deposition
- (2017) Fei Huang et al. PHYSICAL CHEMISTRY CHEMICAL PHYSICS
- Domain Pinning: Comparison of Hafnia and PZT Based Ferroelectrics
- (2017) Franz P. G. Fengler et al. Advanced Electronic Materials
- Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films
- (2016) Takahisa Shiraishi et al. APPLIED PHYSICS LETTERS
- Ferroelectricity of nondoped thin HfO2films in TiN/HfO2/TiN stacks
- (2016) Tomonori Nishimura et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Structural Changes Underlying Field-Cycling Phenomena in Ferroelectric HfO2Thin Films
- (2016) Everett D. Grimley et al. Advanced Electronic Materials
- Complex Internal Bias Fields in Ferroelectric Hafnium Oxide
- (2015) Tony Schenk et al. ACS Applied Materials & Interfaces
- Charge transport in amorphous Hf0.5Zr0.5O2
- (2015) D. R. Islamov et al. APPLIED PHYSICS LETTERS
- Ferroelectricity in undoped hafnium oxide
- (2015) Patrick Polakowski et al. APPLIED PHYSICS LETTERS
- On the structural origins of ferroelectricity in HfO2 thin films
- (2015) Xiahan Sang et al. APPLIED PHYSICS LETTERS
- The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model
- (2015) R. Materlik et al. JOURNAL OF APPLIED PHYSICS
- Confinement-free annealing induced ferroelectricity in Hf0.5Zr0.5O2 thin films
- (2015) A. Chernikova et al. MICROELECTRONIC ENGINEERING
- Chemical Solution Deposition of Ferroelectric Hafnium Oxide for Future Lead Free Ferroelectric Devices
- (2015) Sergej Starschich et al. ECS Journal of Solid State Science and Technology
- Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer
- (2014) Han Joon Kim et al. APPLIED PHYSICS LETTERS
- GSAS-II: the genesis of a modern open-source all purpose crystallography software package
- (2013) Brian H. Toby et al. JOURNAL OF APPLIED CRYSTALLOGRAPHY
- Incipient Ferroelectricity in Al-Doped HfO2 Thin Films
- (2012) Stefan Mueller et al. ADVANCED FUNCTIONAL MATERIALS
- Ferroelectricity in Simple Binary ZrO2 and HfO2
- (2012) Johannes Müller et al. NANO LETTERS
- Measurement of oxygen diffusion in nanometer scale HfO2 gate dielectric films
- (2011) Sufi Zafar et al. APPLIED PHYSICS LETTERS
- Phase transitions in ferroelectric silicon doped hafnium oxide
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
- Ferroelectricity in hafnium oxide thin films
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
- Ferroelectric Zr0.5Hf0.5O2thin films for nonvolatile memory applications
- (2011) J. Müller et al. APPLIED PHYSICS LETTERS
- Ferroelectricity in yttrium-doped hafnium oxide
- (2011) J. Müller et al. JOURNAL OF APPLIED PHYSICS
- Elastic properties of cubic, tetragonal and monoclinic ZrO2 from first-principles calculations
- (2011) Xu-Shan Zhao et al. JOURNAL OF NUCLEAR MATERIALS
- Gate Oxides Beyond SiO2
- (2011) Darrell G. Schlom et al. MRS BULLETIN
- Compositional Stresses in Polycrystalline Titania Films
- (2008) Sidharth Bhatia et al. JOURNAL OF THE AMERICAN CERAMIC SOCIETY
Find the ideal target journal for your manuscript
Explore over 38,000 international journals covering a vast array of academic fields.
SearchCreate your own webinar
Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.
Create Now