Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films

HfxZr1 − xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison

(2020) Monica Materano et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Phase-Exchange-Driven Wake-Up and Fatigue in Ferroelectric Hafnium Zirconium Oxide Films

(2020) Shelby S. Fields et al.   ACS Applied Materials & Interfaces

A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors

(2020) Baek Su Kim et al.   Nanoscale Research Letters

Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers

(2020) Raffaella Lo Nigro et al.   JOURNAL OF CRYSTAL GROWTH

Universal Curie constant and pyroelectricity in doped ferroelectric HfO2 thin films

(2020) Patrick D. Lomenzo et al.   Nano Energy

A Gibbs energy view of double hysteresis in ZrO2 and Si-doped HfO2

(2020) Patrick D. Lomenzo et al.   APPLIED PHYSICS LETTERS

Stress-Induced Crystallization of Thin Hf1-XZrXO2 Films: The Origin of Enhanced Energy Density with Minimized Energy Loss for Lead-Free Electrostatic Energy Storage Applications

(2019) Si Joon Kim et al.   ACS Applied Materials & Interfaces

Exploring New Metal Electrodes for Ferroelectric Aluminum-Doped Hafnium Oxide

(2019) Hojoon Ryu et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Bulk Depolarization Fields as a Major Contributor to the Ferroelectric Reliability Performance in Lanthanum Doped Hf 0.5 Zr 0.5 O 2 Capacitors

(2019) Furqan Mehmood et al.   Advanced Materials Interfaces

Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium

(2019) Uwe Schroeder et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications

(2019) Woojin Jeon   JOURNAL OF MATERIALS RESEARCH

A comprehensive study on the mechanism of ferroelectric phase formation in hafnia-zirconia nanolaminates and superlattices

(2019) Min Hyuk Park et al.   Applied Physics Reviews

Review and perspective on ferroelectric HfO2-based thin films for memory applications

(2018) Min Hyuk Park et al.   MRS Communications

Thermodynamic control of ferroelectric-phase formation in HfxZr1−xO2 and ZrO2

(2018) Shigehisa Shibayama et al.   JOURNAL OF APPLIED PHYSICS

Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment

(2017) Min Hyuk Park et al.   Nanoscale

Induction of ferroelectricity in nanoscale ZrO 2 /HfO 2 bilayer thin films on Pt/Ti/SiO 2 /Si substrates

(2016) Y.W. Lu et al.   ACTA MATERIALIA

Annealing behavior of ferroelectric Si-doped HfO2 thin films

(2016) Patrick D. Lomenzo et al.   THIN SOLID FILMS

The demonstration of significant ferroelectricity in epitaxial Y-doped HfO2 film

(2016) Takao Shimizu et al.   Scientific Reports

Complex Internal Bias Fields in Ferroelectric Hafnium Oxide

(2015) Tony Schenk et al.   ACS Applied Materials & Interfaces

Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time

(2015) Harm C. M. Knoops et al.   APPLIED PHYSICS LETTERS

Ferroelectricity in undoped hafnium oxide

(2015) Patrick Polakowski et al.   APPLIED PHYSICS LETTERS

The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model

(2015) R. Materlik et al.   JOURNAL OF APPLIED PHYSICS

TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films

(2015) Patrick D. Lomenzo et al.   JOURNAL OF APPLIED PHYSICS

Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects

(2015) J. Muller et al.   ECS Journal of Solid State Science and Technology

Ferroelectricity in Rare-Earth Modified Hafnia Thin Films Deposited by Sequential Pulsed Laser Deposition

(2015) Y. Sharma et al.   ECS Solid State Letters

Chemical solution deposition of ferroelectric yttrium-doped hafnium oxide films on platinum electrodes

(2014) S. Starschich et al.   APPLIED PHYSICS LETTERS

Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature

(2013) Min Hyuk Park et al.   APPLIED PHYSICS LETTERS

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

(2013) Ville Miikkulainen et al.   JOURNAL OF APPLIED PHYSICS

Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma

(2013) Claudia Richter et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ferroelectricity in Simple Binary ZrO2 and HfO2

(2012) Johannes Müller et al.   NANO LETTERS

Ferroelectricity in hafnium oxide thin films

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS

Ferroelectric Zr0.5Hf0.5O2thin films for nonvolatile memory applications

(2011) J. Müller et al.   APPLIED PHYSICS LETTERS

Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

(2010) Vikrant R. Rai et al.   LANGMUIR

Size-dependent polymorphism in HfO2 nanotubes and nanoscale thin films

(2009) Michael Shandalov et al.   JOURNAL OF APPLIED PHYSICS

Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide

(2009) Vikrant R. Rai et al.   Journal of Physical Chemistry C

Surface Reaction Mechanisms during Ozone-Based Atomic Layer Deposition of Titanium Dioxide

(2008) Vikrant R. Rai et al.   Journal of Physical Chemistry C