Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma

标题
Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 32, Issue 1, Pages 01A117
出版商
American Vacuum Society
发表日期
2013-12-12
DOI
10.1116/1.4842675

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