Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO
出版年份 2015 全文链接
标题
Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO
作者
关键词
-
出版物
Journal of Materials Chemistry C
Volume 3, Issue 13, Pages 3095-3107
出版商
Royal Society of Chemistry (RSC)
发表日期
2015-02-05
DOI
10.1039/c4tc02707h
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