Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD

Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides

(2011) H. B. Profijt et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Patterned deposition by plasma enhanced spatial atomic layer deposition

(2011) Paul Poodt et al.   Physica Status Solidi-Rapid Research Letters

Utilisation of continuous atomic layer deposition process for barrier enhancement of extrusion-coated paper

(2011) Kimmo Lahtinen et al.   SURFACE & COATINGS TECHNOLOGY

High-Speed Spatial Atomic-Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation

(2010) Paul Poodt et al.   ADVANCED MATERIALS

Influence of the Deposition Temperature on the c-Si Surface Passivation by Al[sub 2]O[sub 3] Films Synthesized by ALD and PECVD

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

(2010) A. J. M. Mackus et al.   JOURNAL OF APPLIED PHYSICS

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

(2010) S. E. Potts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Remote Plasma ALD of Platinum and Platinum Oxide Films

(2009) H. C. M. Knoops et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Oxide Electronics by Spatial Atomic Layer Deposition

(2009) David H. Levy et al.   Journal of Display Technology

Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

(2008) Seong Keun Kim et al.   ADVANCED MATERIALS

Stable ZnO thin film transistors by fast open air atomic layer deposition

(2008) David H. Levy et al.   APPLIED PHYSICS LETTERS