Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties

Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks

(2011) G. Dingemans et al.   APPLIED PHYSICS LETTERS

Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition

(2011) G. Dingemans et al.   JOURNAL OF APPLIED PHYSICS

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma enhanced atomic layer deposition of SiNx:H and SiO2

(2011) Sean W. King   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Silicon Surface Passivation by Thin Thermal Oxide/PECVD Layer Stack Systems

(2011) Sebastian Mack et al.   IEEE Journal of Photovoltaics

Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

(2010) N. M. Terlinden et al.   APPLIED PHYSICS LETTERS

Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

(2010) G. Dingemans et al.   APPLIED PHYSICS LETTERS

Influence of the Deposition Temperature on the c-Si Surface Passivation by Al[sub 2]O[sub 3] Films Synthesized by ALD and PECVD

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3]

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

(2010) Seok-Jun Won et al.   IEEE ELECTRON DEVICE LETTERS

Low Surface Recombination Velocity on (100) Silicon by Electrochemically Grown Silicon Dioxide Annealed at Low Temperature

(2010) Nicholas Ewen Grant et al.   IEEE ELECTRON DEVICE LETTERS

Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties

(2010) D. Hiller et al.   JOURNAL OF APPLIED PHYSICS

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

(2010) S. E. Potts et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film

(2010) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications

(2009) D. Hoogeland et al.   JOURNAL OF APPLIED PHYSICS

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

(2009) A. J. M. Mackus et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Silicon surface passivation by ultrathin Al2O3films synthesized by thermal and plasma atomic layer deposition

(2009) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

Rapid SiO2Atomic Layer Deposition Using Tris(tert-pentoxy)silanol

(2008) B. B. Burton et al.   CHEMISTRY OF MATERIALS

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

(2008) S. B. S. Heil et al.   JOURNAL OF APPLIED PHYSICS

Bis(diethylamino) Silane as the Silicon Precursor in the Atomic Layer Deposition of HfSiO[sub x]

(2008) Rajesh Katamreddy et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma

(2008) S. B. S. Heil et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Thermal oxidation for crystalline silicon solar cells exceeding 19% efficiency applying industrially feasible process technology

(2008) Oliver Schultz et al.   PROGRESS IN PHOTOVOLTAICS