Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties

标题
Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 107, Issue 6, Pages 064314
出版商
AIP Publishing
发表日期
2010-03-30
DOI
10.1063/1.3327430

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