SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

标题
SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy
作者
关键词
-
出版物
Journal of Physical Chemistry C
Volume 113, Issue 19, Pages 8249-8257
出版商
American Chemical Society (ACS)
发表日期
2009-04-18
DOI
10.1021/jp806638e

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