Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks

Surface passivation of n-type Czochralski silicon substrates by thermal-SiO2/plasma-enhanced chemical vapor deposition SiN stacks

(2010) Yevgeniya Larionova et al.   APPLIED PHYSICS LETTERS

Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

(2010) N. M. Terlinden et al.   APPLIED PHYSICS LETTERS

Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

(2010) G. Dingemans et al.   APPLIED PHYSICS LETTERS

Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3]

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Interpretation of recombination at c-Si/SiNx interfaces by surface damage

(2010) Silke Steingrube et al.   JOURNAL OF APPLIED PHYSICS

Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film

(2010) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

Recent developments in rear-surface passivation at Fraunhofer ISE

(2009) Marc Hofmann et al.   SOLAR ENERGY MATERIALS AND SOLAR CELLS

Negative charge and charging dynamics in Al[sub 2]O[sub 3] films on Si characterized by second-harmonic generation

(2008) J. J. H. Gielis et al.   JOURNAL OF APPLIED PHYSICS

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

(2008) J. Schmidt et al.   PROGRESS IN PHOTOVOLTAICS