ALD and Parasitic Growth Characteristics of the Tetrakisethylmethylamino Hafnium (TEMAH)/H[sub 2]O Process

标题
ALD and Parasitic Growth Characteristics of the Tetrakisethylmethylamino Hafnium (TEMAH)/H[sub 2]O Process
作者
关键词
-
出版物
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 157, Issue 11, Pages G225
出版商
The Electrochemical Society
发表日期
2010-09-30
DOI
10.1149/1.3473805

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