Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions

标题
Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 35, Issue 1, Pages 01B101
出版商
American Vacuum Society
发表日期
2016-10-01
DOI
10.1116/1.4963368

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