Study of a Vanadium Precursor for VO2 Thin-Film Growth in the Atomic Layer Deposition Process by Multiscale Simulations

标题
Study of a Vanadium Precursor for VO2 Thin-Film Growth in the Atomic Layer Deposition Process by Multiscale Simulations
作者
关键词
-
出版物
Journal of Physical Chemistry C
Volume 120, Issue 49, Pages 28193-28203
出版商
American Chemical Society (ACS)
发表日期
2016-11-12
DOI
10.1021/acs.jpcc.6b06347

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