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Title
The future of focused electron beam-induced processing
Authors
Keywords
Electron Beam Lithography, Precursor Molecule, Lithography Technique, Dissociative Electron Attachment, Primary Electron Beam
Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 117, Issue 4, Pages 1599-1605
Publisher
Springer Nature
Online
2014-11-15
DOI
10.1007/s00339-014-8847-8
References
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