Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

Published 2009 View Full Article

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Title
Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art
Authors
Keywords
-
Journal
NANOTECHNOLOGY
Volume 20, Issue 29, Pages 292001
Publisher
IOP Publishing
Online
2009-07-02
DOI
10.1088/0957-4484/20/29/292001

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