Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

Title
Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat
Authors
Keywords
-
Journal
Nature Nanotechnology
Volume 12, Issue 6, Pages 575-581
Publisher
Springer Nature
Online
2017-03-24
DOI
10.1038/nnano.2017.34

Ask authors/readers for more resources

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started