Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

标题
Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat
作者
关键词
-
出版物
Nature Nanotechnology
Volume 12, Issue 6, Pages 575-581
出版商
Springer Nature
发表日期
2017-03-24
DOI
10.1038/nnano.2017.34

向作者/读者发起求助以获取更多资源

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation