Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
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Title
Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
Authors
Keywords
Non-volatile memory, Atomic layer deposition, Resistance random access memory, Trilayer structure
Journal
Nanoscale Research Letters
Volume 10, Issue 1, Pages -
Publisher
Springer Nature
Online
2015-03-19
DOI
10.1186/s11671-015-0846-y
References
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