Surface chemistry of group 11 atomic layer deposition precursors on silica using solid-state nuclear magnetic resonance spectroscopy

Atomic Layer Deposition of Gold Metal

(2015) Matthew B. E. Griffiths et al.   CHEMISTRY OF MATERIALS

Quantitative Surface Coverage Calculations via Solid-State NMR for Thin Film Depositions: A Case Study for Silica and a Gallium Amidinate

(2014) Peter J. Pallister et al.   Journal of Physical Chemistry C

Trends in Copper Precursor Development for CVD and ALD Applications

(2014) Peter G. Gordon et al.   ECS Journal of Solid State Science and Technology

Deposition of Copper by Plasma-Enhanced Atomic Layer Deposition Using a Novel N-Heterocyclic Carbene Precursor

(2013) Jason P. Coyle et al.   CHEMISTRY OF MATERIALS

Mechanisms of surface reactions in thin solid film chemical deposition processes

(2013) Francisco Zaera   COORDINATION CHEMISTRY REVIEWS

In SituStudies on Reaction Mechanisms in Atomic Layer Deposition

(2013) Kjell Knapas et al.   CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES

Copper Iminopyrrolidinates: A Study of Thermal and Surface Chemistry

(2013) Jason P. Coyle et al.   INORGANIC CHEMISTRY

Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy

(2013) Rohan P. Chaukulkar et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Preventing thermolysis: precursor design for volatile copper compounds

(2012) Jason P. Coyle et al.   CHEMICAL COMMUNICATIONS

Atomic layer deposition: A versatile technique for plasmonics and nanobiotechnology

(2012) Hyungsoon Im et al.   JOURNAL OF MATERIALS RESEARCH

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

(2012) J A van Delft et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition

(2011) Vikrant R. Rai et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

A Family of Heteroleptic Titanium Guanidinates: Synthesis, Thermolysis, and Surface Reactivity

(2010) Yamile A. Wasslen et al.   INORGANIC CHEMISTRY

Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

(2010) Vikrant R. Rai et al.   LANGMUIR

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

Thermodynamics of N-Heterocyclic Carbene Dimerization: The Balance of Sterics and Electronics

(2008) Albert Poater et al.   ORGANOMETALLICS