Trends in Copper Precursor Development for CVD and ALD Applications

Low-Temperature Atomic Layer Deposition of Copper Films Using Borane Dimethylamine as the Reducing Co-reagent

(2014) Lakmal C. Kalutarage et al.   CHEMISTRY OF MATERIALS

Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

(2014) Gangotri Dey et al.   RSC Advances

Atomic layer deposition of Cu with a carbene-stabilized Cu(i) silylamide

(2014) Dirk J. Hagen et al.   Journal of Materials Chemistry C

Deposition of Copper by Plasma-Enhanced Atomic Layer Deposition Using a Novel N-Heterocyclic Carbene Precursor

(2013) Jason P. Coyle et al.   CHEMISTRY OF MATERIALS

Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films

(2013) Thomas J. Knisley et al.   COORDINATION CHEMISTRY REVIEWS

Copper Iminopyrrolidinates: A Study of Thermal and Surface Chemistry

(2013) Jason P. Coyle et al.   INORGANIC CHEMISTRY

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

(2013) Ville Miikkulainen et al.   JOURNAL OF APPLIED PHYSICS

Mechanism for the Atomic Layer Deposition of Copper Using Diethylzinc as the Reducing Agent: A Density Functional Theory Study Using Gas-Phase Molecules as a Model

(2012) Gangotri Dey et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition

(2011) Thomas J. Knisley et al.   CHEMISTRY OF MATERIALS

Decomposition Schemes of Copper(I) N,N′-Diisopropylacetamidinate During Chemical Vapor Deposition of Copper

(2011) A. Turgambaeva et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Filling Narrow Trenches by Iodine-Catalyzed CVD of Copper and Manganese on Manganese Nitride Barrier/Adhesion Layers

(2011) Yeung Au et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effects of the substrate temperature on the Cu seed layer formed using atomic layer deposition

(2011) Dae-Yong Moon et al.   THIN SOLID FILMS

Anomalous permittivity and plasmon resonances of copper nanoparticle conformal coatings on optical fibers

(2011) Li-Yang Shao et al.   Optical Materials Express

Investigation of AlMe3, BEt3, and ZnEt2as Co-Reagents for Low-Temperature Copper Metal ALD/Pulsed-CVD

(2010) Balamurugan Vidjayacoumar et al.   CHEMISTRY OF MATERIALS

Growth of Cu Metal Films at Room Temperature Using Catalyzed Reactions

(2010) Sang-Woo Kang et al.   CHEMISTRY OF MATERIALS

Gas-Phase Thermolysis of a Guanidinate Precursor of Copper Studied by Matrix Isolation, Time-of-Flight Mass Spectrometry, and Computational Chemistry

(2010) Jason P. Coyle et al.   INORGANIC CHEMISTRY

Formation of Cu nanocrystals on 3-mercaptopropyltrimethoxysilane monolayer by pulsed iodine-assisted chemical vapor deposition for nonvolatile memory applications

(2009) Heejung Park et al.   APPLIED PHYSICS LETTERS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces

(2009) Qiang Ma et al.   CHEMISTRY OF MATERIALS

The Effect of Plasma Treatment on Adsorbed Iodine as a Catalyst in Chemical Vapor Deposition of Copper and Application to Filling of Deep Trenches with High Aspect Ratios

(2009) Do-Seon Lee et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor

(2009) Dae-Yong Moon et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Characterization of ALD copper thin films on palladium seed layers

(2009) Irene J. Hsu et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Synthesis and Thermal Chemistry of Copper (I) Guanidinates

(2007) Jason P. Coyle et al.   INORGANIC CHEMISTRY