Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties

A vertical lamellae arrangement of sub-16 nm pitch (domain spacing) in a microphase separated PS-b-PEO thin film by salt addition

(2015) Tandra Ghoshal et al.   Journal of Materials Chemistry C

Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography

(2014) Justin G. Kennemur et al.   MACROMOLECULES

Fabrication of Ordered, Large Scale, Horizontally-Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach

(2013) Tandra Ghoshal et al.   ADVANCED MATERIALS

Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems

(2013) Dipu Borah et al.   LANGMUIR

Remarkably Rich Variety of Nanostructures and Order–Order Transitions in a Rod–Coil Diblock Copolymer

(2013) Ling-Ying Shi et al.   MACROMOLECULES

Elements of functional ion/block copolymer hybrids

(2013) Feifei Xue et al.   RSC Advances

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

(2013) Tandra Ghoshal et al.   Scientific Reports

Large Scale Monodisperse Hexagonal Arrays of Superparamagnetic Iron Oxides Nanodots: A Facile Block Copolymer Inclusion Method

(2012) Tandra Ghoshal et al.   ADVANCED MATERIALS

A general method for controlled nanopatterning of oxide dots: a microphase separated block copolymer platform

(2012) Tandra Ghoshal et al.   JOURNAL OF MATERIALS CHEMISTRY

“In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays

(2012) Tandra Ghoshal et al.   Nanoscale

Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly

(2012) Richard A. Farrell et al.   Nanoscale

Nanoscale patterning of complex magnetic nanostructures by reduction with low-energy protons

(2012) Sanghoon Kim et al.   Nature Nanotechnology

Inorganic block copolymer lithography

(2012) Adam Nunns et al.   POLYMER

Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains

(2012) C. M. Bates et al.   SCIENCE

Reticulated Nanoporous Polymers by Controlled Polymerization-Induced Microphase Separation

(2012) M. Seo et al.   SCIENCE

Cyclical “Flipping” of Morphology in Block Copolymer Thin Films

(2011) Parvaneh Mokarian-Tabari et al.   ACS Nano

Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch−2

(2011) Ji Xu et al.   ADVANCED MATERIALS

Poly(ethylene oxide)-b-poly(l-lactide) Diblock Copolymer/Carbon Nanotube-Based Nanocomposites: LiCl as Supramolecular Structure-Directing Agent

(2011) Franck Meyer et al.   BIOMACROMOLECULES

Fast dynamic wetting of polymer surfaces by miscible and immiscible liquids

(2011) Pranesh Muralidhar et al.   COLLOID AND POLYMER SCIENCE

Directed block copolymer self-assembly for nanoelectronics fabrication

(2011) Daniel J.C. Herr   JOURNAL OF MATERIALS RESEARCH

Plasma etch technologies for the development of ultra-small feature size transistor devices

(2011) D Borah et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Specific Salt Effects on Poly(ethylene oxide) Electrolyte Solutions

(2011) Chun-lai Ren et al.   MACROMOLECULES

Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

(2010) Joy Y. Cheng et al.   ACS Nano

Self-assembled templates for the generation of arrays of 1-dimensional nanostructures: From molecules to devices

(2010) Richard A. Farrell et al.   JOURNAL OF COLLOID AND INTERFACE SCIENCE

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

(2009) Joona Bang et al.   ADVANCED MATERIALS

Patterning and Templating for Nanoelectronics

(2009) Kosmas Galatsis et al.   ADVANCED MATERIALS

Quantitative analysis of iron oxides using Fourier transform infrared spectrophotometry

(2008) H. Namduri et al.   CORROSION SCIENCE

SAXS Analysis of the Order−Disorder Transition and the Interaction Parameter of Polystyrene-block-poly(methyl methacrylate)

(2008) Yue Zhao et al.   MACROMOLECULES

Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

(2008) R. Ruiz et al.   SCIENCE