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Title
Plasmonic Lithography: Recent Progress
Authors
Keywords
-
Journal
Advanced Optical Materials
Volume -, Issue -, Pages 1801653
Publisher
Wiley
Online
2019-05-02
DOI
10.1002/adom.201801653
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- (2017) Liqin Liu et al. Advanced Optical Materials
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- Liquid metal alloy ion sources—An alternative for focussed ion beam technology
- (2016) Lothar Bischoff et al. Applied Physics Reviews
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- (2015) Ping Gao et al. APPLIED PHYSICS LETTERS
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- (2015) Yang Chen et al. OPTICS EXPRESS
- Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme
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- High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field
- (2015) X. Wen et al. Scientific Reports
- Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography
- (2015) Gaofeng Liang et al. Advanced Optical Materials
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- (2014) W. F. van Dorp APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
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- (2014) Jianjie Dong et al. Scientific Reports
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- (2013) Hana Šípová et al. ANALYTICA CHIMICA ACTA
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- (2012) Nathan C Lindquist et al. REPORTS ON PROGRESS IN PHYSICS
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- (2010) Matteo Altissimo Biomicrofluidics
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- Flying plasmonic lens in the near field for high-speed nanolithography
- (2008) Werayut Srituravanich et al. Nature Nanotechnology
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