Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens

Title
Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 106, Issue 9, Pages 093110
Publisher
AIP Publishing
Online
2015-03-05
DOI
10.1063/1.4914000

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