Large-Area High Aspect Ratio Plasmonic Interference Lithography Utilizing a Single High-k Mode

Published 2016 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Large-Area High Aspect Ratio Plasmonic Interference Lithography Utilizing a Single High-k Mode
Authors
Keywords
-
Journal
ACS Nano
Volume 10, Issue 4, Pages 4039-4045
Publisher
American Chemical Society (ACS)
Online
2016-04-14
DOI
10.1021/acsnano.5b06137

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.