Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition
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Title
Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition
Authors
Keywords
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Journal
Nanomaterials
Volume 8, Issue 12, Pages 1008
Publisher
MDPI AG
Online
2018-12-06
DOI
10.3390/nano8121008
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