Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition
出版年份 2018 全文链接
标题
Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition
作者
关键词
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出版物
Nanomaterials
Volume 8, Issue 12, Pages 1008
出版商
MDPI AG
发表日期
2018-12-06
DOI
10.3390/nano8121008
参考文献
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