Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

Published 2016 View Full Article

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Title
Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
Authors
Keywords
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Journal
AIP Advances
Volume 6, Issue 6, Pages 065012
Publisher
AIP Publishing
Online
2016-06-15
DOI
10.1063/1.4954238
References
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