Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

Published 2011 View Full Article

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Title
Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 158, Issue 5, Pages G108
Publisher
The Electrochemical Society
Online
2011-03-17
DOI
10.1149/1.3559458
References
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