Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films

Title
Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films
Authors
Keywords
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Journal
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Volume 16, Issue 39, Pages 21804-21811
Publisher
Royal Society of Chemistry (RSC)
Online
2015-05-29
DOI
10.1039/c4cp03430a

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