Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films
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Title
Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films
Authors
Keywords
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Journal
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Volume 16, Issue 39, Pages 21804-21811
Publisher
Royal Society of Chemistry (RSC)
Online
2015-05-29
DOI
10.1039/c4cp03430a
References
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