Effect of boron concentration on recombination at the p-Si–Al2O3 interface

Empirical determination of the energy band gap narrowing in highly doped n+ silicon

(2013) Di Yan et al.   JOURNAL OF APPLIED PHYSICS

Deposition temperature independent excellent passivation of highly boron doped silicon emitters by thermal atomic layer deposited Al2O3

(2013) Baochen Liao et al.   JOURNAL OF APPLIED PHYSICS

Modeling Recombination at the Si–Al$_{2}$O $_{3}$ Interface

(2013) L. E. Black et al.   IEEE Journal of Photovoltaics

Progress in Surface Passivation of Heavily Doped n-Type and p-Type Silicon by Plasma-Deposited AlO $_{\bm x}$/SiN$_{\bm x}$ Dielectric Stacks

(2013) Shubham Duttagupta et al.   IEEE Journal of Photovoltaics

Surface Passivation of Boron-Diffused p-Type Silicon Surfaces With (1 0 0) and (1 1 1) Orientations by ALD Al$_{2}$O$_{3}$ Layers

(2013) Wensheng Liang et al.   IEEE Journal of Photovoltaics

Surface passivation of c-Si by atmospheric pressure chemical vapor deposition of Al2O3

(2012) Lachlan E. Black et al.   APPLIED PHYSICS LETTERS

Improved quantitative description of Auger recombination in crystalline silicon

(2012) Armin Richter et al.   PHYSICAL REVIEW B

Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor

(2012) Shubham Duttagupta et al.   PROGRESS IN PHOTOVOLTAICS

Very low surface recombination velocity of boron doped emitter passivated with plasma-enhanced chemical-vapor-deposited AlOx layers

(2012) Pierre Saint-Cast et al.   THIN SOLID FILMS

Boron Emitter Passivation With Al$_{\bf 2}$O $_{\bf 3}$ and Al$_{\bf 2}$O$_{\bf 3}$/SiN$_{\bm x}$ Stacks Using ALD Al$_{\bf 2}$O $_{\bf 3}$

(2012) Armin Richter et al.   IEEE Journal of Photovoltaics

Process Control of Reactive Sputter Deposition of AlO $_{x}$ and Improved Surface Passivation of Crystalline Silicon

(2012) Xinyu Zhang et al.   IEEE Journal of Photovoltaics

High Quality Aluminum Oxide Passivation Layer for Crystalline Silicon Solar Cells Deposited by Parallel-Plate Plasma-Enhanced Chemical Vapor Deposition

(2009) Shinsuke Miyajima et al.   Applied Physics Express

Very low surface recombination velocity on p-type c-Si by high-rate plasma-deposited aluminum oxide

(2009) Pierre Saint-Cast et al.   APPLIED PHYSICS LETTERS

Effective surface passivation of crystalline silicon by rf sputtered aluminum oxide

(2009) Tsu-Tsung Li et al.   Physica Status Solidi-Rapid Research Letters

The effect of boron diffusions on the defect density and recombination at the (111) silicon-silicon oxide interface

(2008) H. Jin et al.   APPLIED PHYSICS LETTERS