Progress in Surface Passivation of Heavily Doped n-Type and p-Type Silicon by Plasma-Deposited AlO $_{\bm x}$/SiN$_{\bm x}$ Dielectric Stacks

Authors

Keywords

Journal

Volume 3, Issue 4, Pages 1163-1169

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Online

2013-07-11

DOI

10.1109/jphotov.2013.2270350

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