Reaction kinetics during the thermal activation of the silicon surface passivation with atomic layer deposited Al2O3
出版年份 2014 全文链接
标题
Reaction kinetics during the thermal activation of the silicon surface passivation with atomic layer deposited Al2O3
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 104, Issue 6, Pages 061606
出版商
AIP Publishing
发表日期
2014-02-16
DOI
10.1063/1.4865901
参考文献
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