In situ x-ray photoelectron spectroscopy and capacitance voltage characterization of plasma treatments for Al2O3/AlGaN/GaN stacks
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Title
In situ x-ray photoelectron spectroscopy and capacitance voltage characterization of plasma treatments for Al2O3/AlGaN/GaN stacks
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 105, Issue 1, Pages 011602
Publisher
AIP Publishing
Online
2014-07-08
DOI
10.1063/1.4887056
References
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