Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

(2016) Cian Cummins et al.   ADVANCED MATERIALS

Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography

(2015) Dipu Borah et al.   ADVANCED FUNCTIONAL MATERIALS

Directed self-assembly of block copolymers for nanocircuitry fabrication

(2015) M.A. Morris   MICROELECTRONIC ENGINEERING

Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates

(2015) Wubin Bai et al.   NANO LETTERS

Substrate-Independent Lamellar Orientation in High-Molecular-Weight Polystyrene-b-poly(methyl methacrylate) Films: Neutral Solvent Vapor and Thermal Annealing Effect

(2014) Eunyoung Choi et al.   MACROMOLECULES

Preparation of PDMS ultrathin films and patterned surface modification with cellulose

(2014) Matej Bračič et al.   RSC Advances

Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process

(2013) Dipu Borah et al.   ACS Applied Materials & Interfaces

Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique

(2013) Dipu Borah et al.   ACS Nano

Directed Assembly of High Molecular Weight Block Copolymers: Highly Ordered Line Patterns of Perpendicularly Oriented Lamellae with Large Periods

(2013) Eunhye Kim et al.   ACS Nano

Achieving structural control with thin polystyrene-b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and process conditions

(2013) Benjamin M.D. O’Driscoll et al.   EUROPEAN POLYMER JOURNAL

Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS

(2013) Dipu Borah et al.   EUROPEAN POLYMER JOURNAL

Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems

(2013) Dipu Borah et al.   LANGMUIR

Directed self-assembly of block copolymers for universal nanopatterning

(2013) Bong Hoon Kim et al.   Soft Matter

Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design

(2013) Mathieu Salaun et al.   Journal of Materials Chemistry C

Selective Sidewall Wetting of Polymer Blocks in Hydrogen Silsesquioxane Directed Self-Assembly of PS-b-PDMS

(2012) Richard G. Hobbs et al.   ACS Applied Materials & Interfaces

Orientation and Alignment Control of Microphase-Separated PS-b-PDMS Substrate Patterns via Polymer Brush Chemistry

(2012) Dipu Borah et al.   ACS Applied Materials & Interfaces

Soft Graphoepitaxy of Hexagonal PS-b-PDMS on Nanopatterned POSS Surfaces fabricated by Nanoimprint Lithography

(2012) C. Simao et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing

(2012) Jeong Gon Son et al.   ACS Macro Letters

Sub-10 nm Nanofabrication via Nanoimprint Directed Self-Assembly of Block Copolymers

(2011) Sang-Min Park et al.   ACS Nano

Temperature-dependence of ink transport during thermal dip-pen nanolithography

(2011) Sungwook Chung et al.   APPLIED PHYSICS LETTERS

Directed Self-Assembly: Expectations and Achievements

(2010) Prashant Kumar   Nanoscale Research Letters

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

(2009) Joona Bang et al.   ADVANCED MATERIALS

Strongly segregated cubic microdomain morphology consistent with the double gyroid phase in high molecular weight diblock copolymers of polystyrene and poly(dimethylsiloxane)

(2009) Nikolaos Politakos et al.   JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

(2009) A E Grigorescu et al.   NANOTECHNOLOGY

Nanowire Conductive Polymer Gas Sensor Patterned Using Self-Assembled Block Copolymer Lithography

(2008) Yeon Sik Jung et al.   NANO LETTERS

Challenges and breakthroughs in recent research on self-assembly

(2008) Katsuhiko Ariga et al.   SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS