Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography

Preparation of PDMS ultrathin films and patterned surface modification with cellulose

(2014) Matej Bračič et al.   RSC Advances

Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process

(2013) Dipu Borah et al.   ACS Applied Materials & Interfaces

Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique

(2013) Dipu Borah et al.   ACS Nano

Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems

(2013) Dipu Borah et al.   LANGMUIR

Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design

(2013) Mathieu Salaun et al.   Journal of Materials Chemistry C

Selective Sidewall Wetting of Polymer Blocks in Hydrogen Silsesquioxane Directed Self-Assembly of PS-b-PDMS

(2012) Richard G. Hobbs et al.   ACS Applied Materials & Interfaces

Orientation and Alignment Control of Microphase-Separated PS-b-PDMS Substrate Patterns via Polymer Brush Chemistry

(2012) Dipu Borah et al.   ACS Applied Materials & Interfaces

Soft Graphoepitaxy of Hexagonal PS-b-PDMS on Nanopatterned POSS Surfaces fabricated by Nanoimprint Lithography

(2012) C. Simao et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Directed self-assembly of block copolymers

(2012) Mikihito Takenaka et al.   Current Opinion in Chemical Engineering

Surface-Directed Dewetting of a Block Copolymer for Fabricating Highly Uniform Nanostructured Microdroplets and Concentric Nanorings

(2011) Richard A. Farrell et al.   ACS Nano

Sub-10 nm Nanofabrication via Nanoimprint Directed Self-Assembly of Block Copolymers

(2011) Sang-Min Park et al.   ACS Nano

Temperature-dependence of ink transport during thermal dip-pen nanolithography

(2011) Sungwook Chung et al.   APPLIED PHYSICS LETTERS

Polymers in conventional and alternative lithography for the fabrication of nanostructures

(2011) Canet Acikgoz et al.   EUROPEAN POLYMER JOURNAL

Plasma etch technologies for the development of ultra-small feature size transistor devices

(2011) D Borah et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Ordered Nanostructure of PS-b-PEO Copolymer by Solvent Annealing with Mixture of Benzene/Water Vapor and Its Micropattern Fabrication

(2010) Tae Hee Kim et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Directed Self-Assembly: Expectations and Achievements

(2010) Prashant Kumar   Nanoscale Research Letters

Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns

(2009) Yeon Sik Jung et al.   ADVANCED MATERIALS

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

(2009) Joona Bang et al.   ADVANCED MATERIALS

Strongly segregated cubic microdomain morphology consistent with the double gyroid phase in high molecular weight diblock copolymers of polystyrene and poly(dimethylsiloxane)

(2009) Nikolaos Politakos et al.   JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

(2009) A E Grigorescu et al.   NANOTECHNOLOGY

Ordering in thin films of block copolymers: Fundamentals to potential applications

(2009) I.W. Hamley   PROGRESS IN POLYMER SCIENCE

Perpendicular orientation of cylindrical domains upon solvent annealing thin films of polystyrene-b-polylactide

(2009) Marylène Vayer et al.   THIN SOLID FILMS

Challenges and breakthroughs in recent research on self-assembly

(2008) Katsuhiko Ariga et al.   SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS