Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
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Title
Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
Authors
Keywords
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Journal
Journal of Materials Chemistry C
Volume 1, Issue 22, Pages 3544
Publisher
Royal Society of Chemistry (RSC)
Online
2013-04-04
DOI
10.1039/c3tc30300d
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