Improving the Silicon Surface Passivation by Aluminum Oxide Grown Using a Non-Pyrophoric Aluminum Precursor

Al 2 O 3 thin films prepared by plasma-enhanced chemical vapor deposition of dimethylaluminum isopropoxide

(2017) Wonjin Ban et al.   THIN SOLID FILMS

Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality

(2015) Yameng Bao et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Characterization of Al2O3 surface passivation of silicon solar cells

(2014) Abdulrahman M. Albadri   THIN SOLID FILMS

Initial Reaction of Dimethylaluminum Isopropoxide with Hydrogen-Terminated Si (001) Surface Using Density Functional Theory

(2013) Dae-Hee Kim et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Advanced modeling of the effective minority carrier lifetime of passivated crystalline silicon wafers

(2012) Fa-Jun Ma et al.   JOURNAL OF APPLIED PHYSICS

Plasma-enhanced and thermal atomic layer deposition of Al2O3using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor

(2012) Stephen E. Potts et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

(2012) G. Dingemans et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Chemical and structural study of electrically passivating Al2O3/Si interfaces prepared by atomic layer deposition

(2012) Volker Naumann et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Energy barriers for trimethylaluminum reaction with varying surface hydroxyl density

(2011) Dae-Hee Kim et al.   APPLIED SURFACE SCIENCE

Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

(2010) G. Dingemans et al.   APPLIED PHYSICS LETTERS

In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

(2009) E Langereis et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Silicon surface passivation by ultrathin Al2O3films synthesized by thermal and plasma atomic layer deposition

(2009) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

(2008) David N. Goldstein et al.   Journal of Physical Chemistry C