Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper

Quantum Chemical Study of the Effect of Precursor Stereochemistry on Dissociative Chemisorption and Surface Redox Reactions During the Atomic Layer Deposition of the Transition Metal Copper

(2015) Gangotri Dey et al.   Journal of Physical Chemistry C

Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

(2014) Gangotri Dey et al.   RSC Advances

Trends in Copper Precursor Development for CVD and ALD Applications

(2014) Peter G. Gordon et al.   ECS Journal of Solid State Science and Technology

Atomic layer deposition of Cu with a carbene-stabilized Cu(i) silylamide

(2014) Dirk J. Hagen et al.   Journal of Materials Chemistry C

Deposition of Copper by Plasma-Enhanced Atomic Layer Deposition Using a Novel N-Heterocyclic Carbene Precursor

(2013) Jason P. Coyle et al.   CHEMISTRY OF MATERIALS

Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films

(2013) Thomas J. Knisley et al.   COORDINATION CHEMISTRY REVIEWS

Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry

(2013) David J.H. Emslie et al.   COORDINATION CHEMISTRY REVIEWS

Reduction mechanisms of the CuO(111) surface through surface oxygen vacancy formation and hydrogen adsorption

(2013) Yasheng Maimaiti et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Plasma enhanced atomic layer deposition of copper: A comparison of precursors

(2013) D.J. Hagen et al.   SURFACE & COATINGS TECHNOLOGY

Mechanism for the Atomic Layer Deposition of Copper Using Diethylzinc as the Reducing Agent: A Density Functional Theory Study Using Gas-Phase Molecules as a Model

(2012) Gangotri Dey et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Deposition of Copper Films with Surface-Activating Agents

(2012) Jeffery S. Thompson et al.   ORGANOMETALLICS

Atomic Layer Deposition of Osmium

(2011) Jani Hämäläinen et al.   CHEMISTRY OF MATERIALS

Surface Chemistry of Copper(I) Acetamidinates in Connection with Atomic Layer Deposition (ALD) Processes

(2011) Qiang Ma et al.   CHEMISTRY OF MATERIALS

Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition

(2011) Thomas J. Knisley et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Fe2O3 Using Ferrocene and Ozone

(2011) Alex B. F. Martinson et al.   Journal of Physical Chemistry C

Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation

(2011) Hideharu Shimizu et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Solution Reactions of a Bis(pyrrolylaldiminate)copper(II) Complex with Peralkyl Zinc, Aluminum, and Boron Reagents: Investigation of the Pathways Responsible for Copper Metal Deposition

(2010) Balamurugan Vidjayacoumar et al.   CHEMISTRY OF MATERIALS

Investigation of AlMe3, BEt3, and ZnEt2as Co-Reagents for Low-Temperature Copper Metal ALD/Pulsed-CVD

(2010) Balamurugan Vidjayacoumar et al.   CHEMISTRY OF MATERIALS

Growth of Cu Metal Films at Room Temperature Using Catalyzed Reactions

(2010) Sang-Woo Kang et al.   CHEMISTRY OF MATERIALS

Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc

(2009) Byoung H. Lee et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO[sub 2]

(2009) Thomas Waechtler et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Characterization of ALD copper thin films on palladium seed layers

(2009) Irene J. Hsu et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper

(2008) L. Wu et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors

(2008) Kate Black et al.   JOURNAL OF MATERIALS CHEMISTRY

New precursors for CVD copper metallization

(2008) John A.T. Norman et al.   MICROELECTRONIC ENGINEERING

Orientation of individualC60molecules adsorbed on Cu(111): Low-temperature scanning tunneling microscopy and density functional calculations

(2008) J. Andreas Larsson et al.   PHYSICAL REVIEW B

Vapor phase deposition of copper films with a Cu(I) β-diketiminate precursor

(2008) Jeffery S. Thompson et al.   THIN SOLID FILMS