Plasma enhanced atomic layer deposition of copper: A comparison of precursors

Title
Plasma enhanced atomic layer deposition of copper: A comparison of precursors
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 230, Issue -, Pages 3-12
Publisher
Elsevier BV
Online
2013-06-22
DOI
10.1016/j.surfcoat.2013.06.066

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