Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications
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Title
Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 121, Issue 20, Pages 204103
Publisher
AIP Publishing
Online
2017-05-26
DOI
10.1063/1.4984068
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Note: Only part of the references are listed.- Evidence for oxygen vacancies movement during wake-up in ferroelectric hafnium oxide
- (2016) S. Starschich et al. APPLIED PHYSICS LETTERS
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- (2016) Patrick D. Lomenzo et al. THIN SOLID FILMS
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- (2016) Everett D. Grimley et al. Advanced Electronic Materials
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- (2015) Tony Schenk et al. ACS Applied Materials & Interfaces
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- (2015) Xiahan Sang et al. APPLIED PHYSICS LETTERS
- Study on the size effect in Hf0.5Zr0.5O2 films thinner than 8 nm before and after wake-up field cycling
- (2015) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- Ferroelectricity in undoped hafnium oxide
- (2015) Patrick Polakowski et al. APPLIED PHYSICS LETTERS
- TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
- (2015) Patrick D. Lomenzo et al. JOURNAL OF APPLIED PHYSICS
- Chemical Solution Deposition of Ferroelectric Hafnium Oxide for Future Lead Free Ferroelectric Devices
- (2015) Sergej Starschich et al. ECS Journal of Solid State Science and Technology
- Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo Electrodes
- (2014) Yeon Woo Yoo et al. ACS Applied Materials & Interfaces
- Ferroelectricity in Si-Doped HfO2Revealed: A Binary Lead-Free Ferroelectric
- (2014) Dominik Martin et al. ADVANCED MATERIALS
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- (2013) Dominik Martin et al. SOLID-STATE ELECTRONICS
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- (2012) Stefan Mueller et al. ADVANCED FUNCTIONAL MATERIALS
- Co-sputtering yttrium into hafnium oxide thin films to produce ferroelectric properties
- (2012) T. Olsen et al. APPLIED PHYSICS LETTERS
- One step synthesis of pure cubic and monoclinic HfO2 nanoparticles: Correlating the structure to the electronic properties of the two polymorphs
- (2012) P. Rauwel et al. JOURNAL OF APPLIED PHYSICS
- Ferroelectricity in Simple Binary ZrO2 and HfO2
- (2012) Johannes Müller et al. NANO LETTERS
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- (2012) S. Mueller et al. ECS Journal of Solid State Science and Technology
- Ferroelectricity in hafnium oxide thin films
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
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- (2011) G. Van den bosch et al. IEEE ELECTRON DEVICE LETTERS
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- (2011) J. Müller et al. JOURNAL OF APPLIED PHYSICS
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- (2009) M. B. Okatan et al. APPLIED PHYSICS LETTERS
- X-ray diffraction studies on asymmetrically broadened peaks of heavily deformed zirconium-based alloys
- (2007) A. Sarkar et al. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
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