Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications

Title
Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 121, Issue 20, Pages 204103
Publisher
AIP Publishing
Online
2017-05-26
DOI
10.1063/1.4984068

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