Annealing behavior of ferroelectric Si-doped HfO2 thin films

Published 2016 View Full Article

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Title
Annealing behavior of ferroelectric Si-doped HfO2 thin films
Authors
Keywords
HfO2, Ferroelectrics, RTA, Breakdown behavior
Journal
THIN SOLID FILMS
Volume 615, Issue -, Pages 139-144
Publisher
Elsevier BV
Online
2016-07-08
DOI
10.1016/j.tsf.2016.07.009

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