Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2

Published 2013 View Full Article

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Title
Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2
Authors
Keywords
-
Journal
SOLID-STATE ELECTRONICS
Volume 88, Issue -, Pages 65-68
Publisher
Elsevier BV
Online
2013-05-04
DOI
10.1016/j.sse.2013.04.013

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