Modulating the extent of fast and slow boron-oxygen related degradation in Czochralski silicon by thermal annealing: Evidence of a single defect
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Title
Modulating the extent of fast and slow boron-oxygen related degradation in Czochralski silicon by thermal annealing: Evidence of a single defect
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 121, Issue 5, Pages 053106
Publisher
AIP Publishing
Online
2017-02-07
DOI
10.1063/1.4975685
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