Fast in-situ photoluminescence analysis for a recombination parameterization of the fast BO defect component in silicon
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Title
Fast in-situ photoluminescence analysis for a recombination parameterization of the fast BO defect component in silicon
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 120, Issue 8, Pages 085705
Publisher
AIP Publishing
Online
2016-08-26
DOI
10.1063/1.4961423
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Note: Only part of the references are listed.- Fast and slow lifetime degradation in boron-doped Czochralski silicon described by a single defect
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- Recombination Activity and Impact of the Boron–Oxygen-Related Defect in Compensated N-Type Silicon
- (2011) F. E. Rougieux et al. IEEE Journal of Photovoltaics
- Minority carrier lifetime in silicon wafers from quasi-steady-state photoluminescence
- (2010) J. A. Giesecke et al. APPLIED PHYSICS LETTERS
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- Generation and annihilation of boron–oxygen-related recombination centers in compensated p- and n-type silicon
- (2010) Bianca Lim et al. JOURNAL OF APPLIED PHYSICS
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- Light-induced boron-oxygen defect generation in compensated p-type Czochralski silicon
- (2009) D. Macdonald et al. JOURNAL OF APPLIED PHYSICS
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