Surface reconstruction of sapphire at the atomic scale via chemical-physical tuning of atmospheric plasma

Material Removal Rate Prediction for Sapphire Double-Sided CMP Based on RSM-SVM

(2022) Zhongyang Li et al.   ECS Journal of Solid State Science and Technology

Tuning the Plasma Etching Mode for the Atomic-Scale Smoothing of Single-Crystal Silicon

(2022) Bing Wu et al.   Journal of Physical Chemistry Letters

Phonon-Trapping-Enhanced Energy Resolution in Superconducting Single-Photon Detectors

(2021) Pieter J. de Visser et al.   Physical Review Applied

Effects of polishing parameters on surface quality in sapphire double-sided CMP

(2020) Zhongyang Li et al.   CERAMICS INTERNATIONAL

An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching

(2020) Zhidong Fang et al.   INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

Catalyzed chemical polishing of SiO2 glasses in pure water

(2019) Daisetsu Toh et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Study on high efficient sapphire wafer processing by coupling SG-mechanical polishing and GLA-CMP

(2018) Yongchao Xu et al.   INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions

(2018) Lei Chen et al.   Nature Communications

Abrasive fine-finishing technology

(2016) Fukuo Hashimoto et al.   CIRP ANNALS-MANUFACTURING TECHNOLOGY

Plasma-assisted polishing of gallium nitride to obtain a pit-free and atomically flat surface

(2015) H. Deng et al.   CIRP ANNALS-MANUFACTURING TECHNOLOGY

Optimization of the plasma oxidation and abrasive polishing processes in plasma-assisted polishing for highly effective planarization of 4H-SiC

(2014) H. Deng et al.   CIRP ANNALS-MANUFACTURING TECHNOLOGY

Chemical and mechanical balance in polishing of electronic materials for defect-free surfaces

(2009) H.S. Lee et al.   CIRP ANNALS-MANUFACTURING TECHNOLOGY