Tuning the Plasma Etching Mode for the Atomic-Scale Smoothing of Single-Crystal Silicon

Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale

(2021) Peizhi Wang et al.   Nanomanufacturing and Metrology

An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching

(2020) Zhidong Fang et al.   INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions

(2018) Lei Chen et al.   Nature Communications

Orientation-dependent nanostructure arrays based on anisotropic silicon wet-etching for repeatable surface-enhanced Raman scattering

(2016) C. G. Wang et al.   Nanoscale

Microsecond pulse driven Ar/CF4 plasma jet for polymethylmethacrylate surface modification at atmospheric pressure

(2015) Ruixue Wang et al.   APPLIED SURFACE SCIENCE

Achievement of a near-perfect smooth silicon surface

(2013) Jing Li et al.   Science China-Technological Sciences

Electron Density and Optical Emission Measurements of SF6/O2Plasmas for Silicon Etch Processes

(2012) M.M. Morshed et al.   PLASMA SCIENCE & TECHNOLOGY

Silicon Crystal Growth and Wafer Technologies

(2012) G. Fisher et al.   PROCEEDINGS OF THE IEEE

Fabrication methods based on wet etching process for the realization of silicon MEMS structures with new shapes

(2010) Prem Pal et al.   MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS

Interface roughness, valley-orbit coupling, and valley manipulation in quantum dots

(2010) Dimitrie Culcer et al.   PHYSICAL REVIEW B

Lithography and Other Patterning Techniques for Future Electronics

(2008) R.F. Pease et al.   PROCEEDINGS OF THE IEEE