Annealing temperature dependence on the structural and optical properties of sputtering-grown high-k HfO2 gate dielectrics
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Title
Annealing temperature dependence on the structural and optical properties of sputtering-grown high-k HfO2 gate dielectrics
Authors
Keywords
Dielectric Function, HfO2, Gate Dielectric, Spectroscopy Ellipsometry, Post Deposition Annealing
Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 25, Issue 9, Pages 4163-4169
Publisher
Springer Nature
Online
2014-07-08
DOI
10.1007/s10854-014-2144-3
References
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