The formation mechanism of (001) preferred orientation for anatase TiO2 film prepared by DC pulsed magnetron sputtering
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Title
The formation mechanism of (001) preferred orientation for anatase TiO2 film prepared by DC pulsed magnetron sputtering
Authors
Keywords
TiO, 2, film, Anatase structure, Sputtering power density, (001) preferred orientation, Dynamic scaling of growing interface
Journal
VACUUM
Volume 190, Issue -, Pages 110287
Publisher
Elsevier BV
Online
2021-05-04
DOI
10.1016/j.vacuum.2021.110287
References
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