The influence of anatase titanium dioxide film (0 0 1) preferred orientation on N implantation process

Title
The influence of anatase titanium dioxide film (0 0 1) preferred orientation on N implantation process
Authors
Keywords
N doped TiO, 2, Ion beam technology, Texture, XPS
Journal
MATERIALS LETTERS
Volume 197, Issue -, Pages 28-30
Publisher
Elsevier BV
Online
2017-03-28
DOI
10.1016/j.matlet.2017.03.149

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