Impact of electrically formed interfacial layer and improved memory characteristics of IrOx/high-κx/W structures containing AlOx, GdOx, HfOx, and TaOx switching materials
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Title
Impact of electrically formed interfacial layer and improved memory characteristics of IrOx/high-κx/W structures containing AlOx, GdOx, HfOx, and TaOx switching materials
Authors
Keywords
Resistive switching, W/TaO<sub>x</sub>, Ti nanolayer, Oxygen ion migration, Nanofilament
Journal
Nanoscale Research Letters
Volume 8, Issue 1, Pages 379
Publisher
Springer Nature
Online
2013-09-06
DOI
10.1186/1556-276x-8-379
References
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