Epitaxial ferroelectric Hf0.5Zr0.5O2 thin film on a buffered YSZ substrate through interface reaction

Pulse wake-up and breakdown investigation of ferroelectric yttrium doped HfO2

(2017) S. Starschich et al.   JOURNAL OF APPLIED PHYSICS

Fatigue mechanism of yttrium-doped hafnium oxide ferroelectric thin films fabricated by pulsed laser deposition

(2017) Fei Huang et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

A comprehensive study on the structural evolution of HfO2 thin films doped with various dopants

(2017) M. H. Park et al.   Journal of Materials Chemistry C

Effect of Zr Content on the Wake-Up Effect in Hf1–xZrxO2 Films

(2016) Min Hyuk Park et al.   ACS Applied Materials & Interfaces

Giant Negative Electrocaloric Effects of Hf0.5Zr0.5O2Thin Films

(2016) Min Hyuk Park et al.   ADVANCED MATERIALS

Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices

(2016) Kiliha Katayama et al.   APPLIED PHYSICS LETTERS

Interface control by chemical and dimensional matching in an oxide heterostructure

(2016) Marita O'Sullivan et al.   Nature Chemistry

The demonstration of significant ferroelectricity in epitaxial Y-doped HfO2 film

(2016) Takao Shimizu et al.   Scientific Reports

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

(2015) Min Hyuk Park et al.   ADVANCED MATERIALS

Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films

(2015) Takao Shimizu et al.   APPLIED PHYSICS LETTERS

Growth of epitaxial orthorhombic YO1.5-substituted HfO2 thin film

(2015) Takao Shimizu et al.   APPLIED PHYSICS LETTERS

On the structural origins of ferroelectricity in HfO2 thin films

(2015) Xiahan Sang et al.   APPLIED PHYSICS LETTERS

The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model

(2015) R. Materlik et al.   JOURNAL OF APPLIED PHYSICS

Ferroelectric phase transitions in nanoscale HfO 2 films enable giant pyroelectric energy conversion and highly efficient supercapacitors

(2015) Michael Hoffmann et al.   Nano Energy

Toward a multifunctional monolithic device based on pyroelectricity and the electrocaloric effect of thin antiferroelectric Hf x Zr 1−x O 2 films

(2015) Min Hyuk Park et al.   Nano Energy

Ferroelectricity in Si-Doped HfO2Revealed: A Binary Lead-Free Ferroelectric

(2014) Dominik Martin et al.   ADVANCED MATERIALS

Pathways towards ferroelectricity in hafnia

(2014) Tran Doan Huan et al.   PHYSICAL REVIEW B

Thin HfxZr1-xO2Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability

(2014) Min Hyuk Park et al.   Advanced Energy Materials

Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature

(2013) Min Hyuk Park et al.   APPLIED PHYSICS LETTERS

Incipient Ferroelectricity in Al-Doped HfO2 Thin Films

(2012) Stefan Mueller et al.   ADVANCED FUNCTIONAL MATERIALS

Stabilization of Tetragonal HfO2 under Low Active Oxygen Source Environment in Atomic Layer Deposition

(2012) Deok-Yong Cho et al.   CHEMISTRY OF MATERIALS

Ferroelectricity in Simple Binary ZrO2 and HfO2

(2012) Johannes Müller et al.   NANO LETTERS

Emerging memories: resistive switching mechanisms and current status

(2012) Doo Seok Jeong et al.   REPORTS ON PROGRESS IN PHYSICS

Ferroelectricity in hafnium oxide thin films

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS

Structural properties and electronic structure ofHfO2-ZrO2composite films

(2010) Deok-Yong Cho et al.   PHYSICAL REVIEW B

Interface-Induced Polarization and Inhibition of Ferroelectricity in EpitaxialSrTiO3/Si

(2010) A. M. Kolpak et al.   PHYSICAL REVIEW LETTERS

The relationship between local order, long range order, and sub-band-gap defects in hafnium oxide and hafnium silicate films

(2008) D. H. Hill et al.   JOURNAL OF APPLIED PHYSICS

Growth Behavior of Atomic-Layer-Deposited Pb(Zr,Ti)O[sub x] Thin Films on Planar Substrate and Three-Dimensional Hole Structures

(2008) Takayuki Watanabe et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY